Nano Fabrication

The BINA Nano Fabrication Facility provides state-of-the-art tools for patterning and crafting devices on a nanometer scale. These includes Class 100 and Class 1000 clean rooms equipped for a variety of fabrication processes including Focused Ion Beam (FIB), e-Beam lithography, photolithography, and a range of tools for PVD (Physical Vapor Deposition), ALD (Atomic Layer Deposition) and ICP-RIE (Reactive Ion Etch) capabilities. These capabilities are strongly backup by our professional staff that offers creative solutions for a wide range of Fabrication processes and Failure Analysis (FA) processes such as cross sectioning, TEM lamellas preparation, circuit editing and nano probing.



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