Dry Etch ICP-RIE

Contacts: Mr. Mark Oksman, mark.oksman@biu.ac.il


Model:  PlasmaTherm Versaline SLR 770 ICP RIE

Manufacture:  Plasmatherm


Dry Etch ICP-RIE produces high density plasmas with the ability to control both ion flux and ion energy independently. Our system with 12 gas lines to Fluorine and Chlorine process and large library of processes for electronic, photonic, MEMS, and nanotechnology applications.


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Reactive Ion etcher

Last Updated Date : 04/04/2024