Dry Etch ICP-RIE

Contacts: Mr. Mark Oksman, mark.oksman@biu.ac.il

Model:  Versaline SLR 770 ICP RIE

Manufacture:  Plasmatherm

Description:

Dry Etch ICP-RIE produces high density plasma with the ability to control both ion flux and ion energy independently. Our system includes with 12 gas lines for Fluorine and Chlorine process and large library of processes for electronic, photonic, MEMS, and nanotechnology applications.

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