Lithography

Precision patterning technologies

BINA offers advanced lithography tools, including photolithography, electron beam lithography and laser lithography for defining micro- and nanoscale structures with high precision.

Our versatile lithography techniques support a wide range of R&D applications, including microelectronics, MEMS, nanophotonics, and advanced materials.

Open to academia and industry, our facility includes expert guidance and full cleanroom access. 
 

For precise patterning, Contact us - gr.biunano@biu.ac.il