High Resolution Laser Lithography
Micro/nano patterning
High-resolution laser lithography system for feature sizes down to 230 nm and 2.5D grayscale patterning with up to 4096 levels.
Contacts: Mr. Mark Oksman, mark.oksman@biu.ac.il
Model: Picomaster 200
Manufacture: 4Pico/Raith
Description:
The versatile, low-maintenance laser writer provides best-in-class resolution for the features and grating periodicity. The system exposes structures with high resolution down to 230 nm as well as 2.5D grey scale structures with 4096 grayscales levels
The Picomaster 200 system intended to close the gap between e-beam lithography with nanometric resolution but slow exposure speed and MLA150 maskless lithography system with very high exposure speed but limited to 1 micron resolution.
Specifications:
Single focused beam writing strategy for highly focused lased beam
| Laser | 405 and 375 nm |
| Resolution (switchable) | 230 nm – 5 µm |
| Substrate size | 5 x 5 mm-220 x 220 mm, 10 mm thickness |
| Writing speed (depends on resolution) | 1.7-43 (mm²/s) |
| Autofocus | Optical with red laser, ± 0.3 mm height variation traking |
| Address grid | Standard: 40 nm in scan direction and programmable in step direction. |
| Grayscale control | 4096 levels |
| Alignment accuracy | <0.25 µm |
| Stich-free exposure |
