Dry Etching Services | ICP-RIE Plasma Etching - BINA

Dry etching services using ICP-RIE plasma etching for semiconductors, MEMS, photonics, and nanomaterials. 

BINA supports precise micro and nanoscale etching for research, prototyping, and device fabrication. 

Serving both academia and industry, our cleanroom facility ensures fine-feature etching with expert support and sub-micron accuracy.

Push the limits of your design, contact us today - gr.biunano@biu.ac.il