Ion Beam Sputtering System

High quality thin films & multilayers

Versatile ion beam sputtering (IBS) system for high-quality thin film deposition. Ideal for optics, photonics, and microelectronics research needing precise control of thickness, uniformity, and composition.

Contacts: Mr. Alex Kleiner, alex.kleiner@biu.ac.il 

Model:  Intelvac Nano Quest

Manufacture:  Intlvac

Description:

Ion Beam Sputtering (IBS) with Ion Assist/Etch is a high-precision thin film deposition technique designed for applications requiring exceptional film quality, such as advanced optical and magnetic coatings. The process operates at low pressure (~10⁻⁴ Torr), allowing sputtered atoms to retain higher kinetic energy due to minimal scattering, which results in:

• Dense, smooth, and pinhole-free films
• Excellent step coverage, even at small thicknesses and on high-aspect-ratio features
• Improved film adhesion and microstructure control through optional ion assist or etching

• This method is ideal for fabricating high-performance multilayer structures where uniformity, surface quality, and reproducibility are critical.

Specifications:

• 4 targets and ION ASSIST/Etch source
• Low pressure sputter deposition (10^-4 Torr)
• High quality, smooth, pin hole free films
• Enhanced adhesion and micro-structure control
• Independent control of ion beam parameters allows user to engineer film with desired properties

Materials that may be deposited

• Oxides: SiO2, Al2O3, HfO2, Ta2O5, TiO2
• Metals: Al, Ag, Ta, Ti, Nb
• Others: Ge, Si, Si p-type, Si n-type, Permalloy, ITO, FTO, MOL4, SiC

Ion Beam sputter Deposition (IBSD)