Ion Beam Sputtering System

Contacts: Mr. Alex Kleiner, alex.kleiner@biu.ac.il 

Model:  Intelvac Nano Quest

Manufacture:  Intlvac

Description:

Ion Beam Sputtering (IBS) with Ion Assist/Etch is a high-precision thin film deposition technique designed for applications requiring exceptional film quality, such as advanced optical and magnetic coatings. The process operates at low pressure (~10⁻⁴ Torr), allowing sputtered atoms to retain higher kinetic energy due to minimal scattering, which results in:

• Dense, smooth, and pinhole-free films
• Excellent step coverage, even at small thicknesses and on high-aspect-ratio features
• Improved film adhesion and microstructure control through optional ion assist or etching

• This method is ideal for fabricating high-performance multilayer structures where uniformity, surface quality, and reproducibility are critical.

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