Ion Beam Supttering System
Contacts: Dr. Joseph Kantorovitsch, joseph.kantorovitsch@gmail.com
Model: Intelvac Nano Quest
Manufacture: Intlvac
Description:
Ion Beam Sputtering (IBS) with Ion Assist/Etch is a high-precision thin film deposition technique designed for applications requiring exceptional film quality, such as advanced optical and magnetic coatings. The process operates at low pressure (~10⁻⁴ Torr), allowing sputtered atoms to retain higher kinetic energy due to minimal scattering, which results in:
- Dense, smooth, and pinhole-free films
- Excellent step coverage, even at small thicknesses and on high-aspect-ratio features
- Improved film adhesion and microstructure control through optional ion assist or etching
This method is ideal for fabricating high-performance multilayer structures where uniformity, surface quality, and reproducibility are critical.

תאריך עדכון אחרון : 23/04/2025