e-beam Evaporation

English

Thin film deposition

Ion-assisted electron beam evaporation system supporting up to 12'' wafers, equipped with dual-crystal QTM for precise thin film deposition.

BINA's Fabrication Unit welcomes both industry professionals and researchers – providing state-of-the-art equipment, expert support, and customized solutions. We’re here for you!


Contacts: Mr. Mark Oksman, mark.oksman@biu.ac.il

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Model:  VST,  FORTUNA custom made

Manufacture:  VST

Description:

Ion assisted e-beam evaporation system is suitable for up to 12" wafers !!! with double crystal QTM for high-accuracy deposition.

Specifications:

  • Substrates up to diameter of 300 mm (12”)!!!

  • 15 kW EB Gun for fast deposition rate

  • High accuracy double crystal QTM for high accuracy deposition

  • 6 x 25CC crucibles

  • Ion assist deposition

  • Ion Beam cleaning

  • Substrate rotation and tilting

  • Progressive shutter possibility for gradient thickness film deposition

  • Robotic arm load lock

Materials that may be deposited

  • Oxides: SiO2, Al2O3, HfO2, ZrO2, TiO2, Nb2O5, Ta2O5, WO3, MgO

  • Metals: Al, Ag, Cr, Ti, Ni, Cu

  • Others: ITO, Si