Etching

BINA offers advanced ICP-RIE technology for precise, anisotropic dry etching at micro- and nanoscale levels, ideal for semiconductors, MEMS, photonics, and nanomaterials. 

Serving both academia and industry, our cleanroom facility ensures fine-feature etching with expert support and sub-micron accuracy. 
Push the limits of your design, contact us today - gr.biunano@biu.ac.il