e-beam Evaporation System
Thin film deposition
Ion-assisted electron beam evaporation system supporting up to 12'' wafers, equipped with dual-crystal QTM for precise thin film deposition.
BINA's Fabrication Unit welcomes both industry professionals and researchers – providing state-of-the-art equipment, expert support, and customized solutions. We’re here for you!
Contacts: Mr. Alex Kleiner, alex.kleiner@biu.ac.il , Mr. Mark Oksman, mark.oksman@biu.ac.il
Model: VST, FORTUNA custom made
Manufacture: VST
Description:
Ion assisted e-beam evaporation system is suitable for up to 12" wafers !!! with double crystal QTM for high-accuracy deposition.
Specifications:
- Substrates up to diameter of 300 mm (12”)!!!
- 15 kW EB Gun for fast deposition rate
- High accuracy double crystal QTM for high accuracy deposition
- 6 x 25CC crucibles
- Ion assist deposition
- Ion Beam cleaning
- Substrate rotation and tilting
- Progressive shutter possibility for gradient thickness film deposition
- Robotic arm load lock
Materials that may be deposited
- Oxides: SiO2, Al2O3, HfO2, ZrO2, TiO2, Nb2O5, Ta2O5, WO3, MgO
- Metals: Al, Ag, Cr, Ti, Ni, Cu
- Others: ITO, Si
Last Updated Date : 25/06/2025
