Atomic Layer Deposition

עברית

 ALD – Atomic Layer Deposition, Cambridge, Fiji F200

 

Specifications: 

  •  6 precursor heated lines
  • ICP Plasma
  • Ozone reactor

 

Material:

  •  Oxides
  •  Nitrides
  •  Metals

 

**** Unique design for ultra-high  aspect ratio structures (> 1:2000)