Atomic Layer Deposition

 ALD – Atomic Layer Deposition, Cambridge, Fiji F200

Specifications

• 6 precursor heated lines

• ICP Plasma

• Ozone reactor

 

Material:

• Oxides

• Nitrides

• Metals

 

**** Unique design for ultra-high  aspect ratio structures (> 1:2000)

 

ALD

Last Updated Date : 07/04/2022