Maskless Lithography, MLA

Contacts: Mark Oksman, mark.oksman@biu.ac.il

Model:  MLA 150

Manufacture:  Hiedelberg Instruments

Description: 

The Maskless Aligner MLA 150 is a cutting-edge maskless lithography tool designed for rapid prototyping, R&D, and small-scale production. It is the fastest maskless lithography system available, offering unparalleled flexibility for applications such as quantum device fabrication (2D materials, semiconductors, nanowires, etc.), MEMS, micro-optics, sensors, actuators, MOEMS, and other material and life sciences technologies.

The MLA 150 enables high-resolution, high-aspect-ratio patterning and can even create grayscale structures depending on the application. It integrates two laser wavelengths (405 nm and 375 nm), allowing exposure of a wide range of photoresists.

Unlike traditional mask aligners, the MLA 150 eliminates the need for photomasks, significantly reducing turnaround times. Design modifications can be implemented immediately by simply updating the CAD layout and exposing the pattern directly.

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