PVD system (Magnetron, Thermal and E-BEAM)
Specifications:
- Sputtering with 4 magnetrons RF/DC
- RF (For Isolators and semiconductors)
- DC (For conductors)
- Ion Beam (For etching)
- Evaporation with E-beam (4 sources) and thermal (2 sources)
- Sample size - Up to 4”
- Load Lock and transferring chamber
- Sample rotation – up to 30rpm
