e-BEAM Evaporation system
Specifications:
- Substrates up to diameter of 300 mm (12”)!!!
- 15 kW EB Gun for fast deposition rate
- High accuracy double crystal QTM for high accuracy deposition
- 6 x 25CC crucibles
- Ion assist deposition
- Ion Beam cleaning
- Substrate rotation and tilting
- Progressive shutter possibility for gradient thickness film deposition
- Robotic arm load lock
Materials that may be deposited
- Oxides: SiO2, Al2O3, HfO2, ZrO2, TiO2, Nb2O5, Ta2O5, WO3, MgO
- Metals: Al, Ag, Cr, Ti, Ni, Cu
- Others: ITO, Si
