E-BEAM Evaporation system
Specifications:
- Substrates up to diameter of 300 mm
- 15 kW EB Gun for fast deposition rate
- High accuracy double crystal QTM
- 6 x 25CC crucibles
- Ion assist deposition
- Ion Beam cleaning
- Substrate rotation and tilting
- Progressive shutter possibility for gradient thickness film deposition
- Robotic arm load lock
