Picomaster 200 High Resolution Laser Lithography
The Picomaster 200 system intended to close the gap between e-beam lithography with nanometric resolution but slow exposure speed and MLA150 maskless lithography system with very high exposure speed but limited to 1 micron resolution.
Specifications:
Single focused beam writing strategy for highly focused lased beam
| Laser | 405 and 375 nm |
| Resolution (switchable) | 230 nm – 5 µm |
| Substrate size | 5 x 5 mm-220 x 220 mm, 10 mm thickness |
| Writing speed (depends on resolution) | 1.7-43 (mm²/s) |
| Autofocus | Optical with red laser, ± 0.3 mm height variation traking |
| Address grid | Standard: 40 nm in scan direction and programmable in step direction. |
| Grayscale control | 4096 levels |
| Alignment accuracy | <0.25 µm |
Stich-free exposure |
