Picomaster 200 High Resolution Laser Lithography
The Picomaster 200 system intended to close the gap between e-beam lithography with nanometric resolution but slow exposure speed and MLA150 maskless lithography system with very high exposure speed but limited to 1 micron resolution.
Specifications:
Single focused beam writing strategy for highly focused lased beam
405 and 375 nm | Laser |
230 nm – 5 µm | Resolution (switchable) |
5 x 5 mm-220 x 220 mm, 10 mm thickness | Substrate size |
1.7-43 (mm²/s) | Writing speed (depends on resolution) |
Optical with red laser, ± 0.3 mm height variation traking | Autofocus |
Standard: 40 nm in scan direction and programmable in step direction. | Address grid |
4096 levels | Grayscale control |
<0.25 µm | Alignment accuracy |
Stich-free exposure |
