Picomaster 200 High Resolution Laser Lithography

The Picomaster 200 system intended to close the gap between e-beam lithography with nanometric resolution but slow exposure speed and MLA150 maskless lithography system with very high exposure speed but limited to 1 micron resolution.

 

Specifications:

Single focused beam writing strategy for highly focused lased beam

405 and 375 nm

Laser

230 nm – 5 µm

Resolution (switchable)

5 x 5 mm-220 x 220 mm, 10 mm thickness

Substrate size

1.7-43 (mm²/s) 

Writing speed (depends on resolution)

Optical with red laser,  ± 0.3 mm height variation traking 

Autofocus

Standard: 40 nm in scan

direction and programmable in step direction.

Address grid  

4096 levels 

Grayscale control 

<0.25 µm 

Alignment accuracy

 

Stich-free exposure

 

litogragpy_0.png

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