Pulse Laser Deposition
Pulse laser deposition
Specifications
- 248nm KrF2 excimer laser
- Up to 400 mJ pulse energy
- 4" sample holder, heatable up to 850°C
- Deposition from up to 6 targets
- Deposition of homogeneous thickness
- Deposition of compositional gradients
Last Updated Date : 30/06/2021
