Pulse Laser Deposition

עברית

    Pulse laser deposition

Specifications
  • 248nm KrF2 excimer laser
  • Up to 400 mJ pulse energy
  • 4" sample holder, heatable up to 850°C
  • Deposition from up to 6 targets
  • Deposition of homogeneous thickness
  • Deposition of compositional gradients
Pulse Laser Deposition

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Last Updated Date : 30/06/2021