Pulse Laser Deposition

    Pulse laser deposition

Specifications: 
  • 248nm KrF2 excimer laser
  • Up to 400 mJ pulse energy
  • 4" sample holder, heatable up to 850°C
  • Deposition from up to 6 targets
  • Deposition of homogeneous thickness
  • Deposition of compositional gradients
Pulse Laser Deposition

More on PLD, Neocera

Book your order for PLD work

  • Last modified: 25/05/2016