The Charged-Particle Microscopy (CPM) facility is equipped with various systems for scanning, transmission electron microscopy, and focused ion beam, including SEMs, TEMs and FIBs. This highly sophisticated equipment is used for advanced imaging, analysis and fabrication for materials science and life sciences for both academic and industrial projects. The instrumentation can provide information about 3D morphology and topography, as well as 2D imaging and patterning at nanometric resolution.
In addition, the facility offers high resolution, bright and dark-field imaging, electron diffraction (ED) including crystallographic information, phase and structure identification, as well as determination of unit cell parameters and analytical capabilities using Energy Dispersive X-ray Spectrometry (EDS).
The Focused Ion Beam (FIB) unit includes a dual beam FIB-SEM system, in addition to the He FIB, which enables triple ion beam focus by combining three separate ion sources−He, Ne and Ga. This unique system provides the capability of sub 10 nm patterning, as well as imaging of non-conductive and magnetic samples, and He ion irradiation of 2D materials.
The CPM unit also provides solutions for life sciences including for investigation of biological specimens, through various types of SEM and TEM for sample preparation and analysis. Several staining and cryo sample preparation methods are offered for visualizing different organelles, their structure and particle size.
Additional capabilities include the imaging of the inner morphology of tissue and cells; analyzing organelle activity and tissue directionality; and studying external cell or tissue surface.
Both the scope and sophistication of its equipment have positioned the CPM facility as an invaluable resource for researchers of semiconductors, ultrafine-grained materials for thin films, 2D materials, solar cells and other fields that are based on nanotechnology, nano devices, and materials science.