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Evaporation & Sputtering

    

Specifications
  • Sputtering chamber with 4 targets, 1 DC Source, 2 RF sources and Ion beam sources for milling
  • Evaporation chamber with 2 thermal sources (high and low temp) and 1 e-beam source with 4 crucibles and a thickness monitor
  • Sample temperature control up to 8000C
  • Joined load lock chamber with sample caste for 5-sample holder up to 4" sample/wafer
  • 4" wafer sample holder
Evaporation & Sputtering

Last Updated Date : 13/07/2021