Pulse Laser Deposition
מפרטים
- 248nm KrF2 excimer laser
- Up to 400 mJ pulse energy
- 4" sample holder, heatable up to 850°C
- Deposition from up to 6 targets
- Deposition of homogeneous thickness
- Deposition of compositional gradients
תאריך עדכון אחרון : 25/05/2016
