Evaporation & Sputtering
מפרטים
- Sputtering chamber with 2 DC sources, 1 RF source and Ion beam source for milling
- Evaporation chamber with 2 thermal sources (high and low temp) and 1 e-beam source with 4 crucibles and a thickness monitor
- Sample temperature control up to 8000C
- Joined load lock chamber with sample caste for 5-sample holder up to 4" sample/wafer
- 4" wafer sample holder
תאריך עדכון אחרון : 30/06/2021
