Pulse Laser Deposition

    

מפרטים: 
  • 248nm KrF2 excimer laser
  • Up to 400 mJ pulse energy
  • 4" sample holder, heatable up to 850°C
  • Deposition from up to 6 targets
  • Deposition of homogeneous thickness
  • Deposition of compositional gradients
Pulse Laser Deposition