Evaporation & Sputtering

    

Specifications: 
  • Sputtering chamber with 2 DC sources, 1 RF source and Ion beam source for milling
  • Evaporation chamber with 2 thermal sources (high and low temp) and 1 e-beam source with 4 crucibles and a thickness monitor
  • Sample temperature control up to 8000C
  • Joined load lock chamber with sample caste for 5-sample holder up to 4" sample/wafer
  • 4" wafer sample holder
Evaporation & Sputtering